Guido Limbach

USPTO Granted Patents = 18 (Patent Applications = 1)

EPO Patents = 3 (Patent Applications = 3)

Average Co-Inventor Count = 7.4

ph-index = 3

Forward Citations = 21(Granted Patents)

Company Filing History:

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2009-2020

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18 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10684551 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2020-06-16),

2. 10317802 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2019-06-11),

3. 10203607 - Optical element unit for exposure processes (2019-02-12),

4. 10031423 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2018-07-24),

5. 9746778 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2017-08-29),

6. 9703098 - Lens module comprising at least one exchangeable optical element (2017-07-11),

7. 9575224 - Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective (2017-02-21),

8. 9551944 - Method for replacing objective parts (2017-01-24),

9. 9423695 - Lens module comprising at least one exchangeable optical element (2016-08-23),

10. 9316929 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2016-04-19),

11. 9175948 - Optical module with a measuring device (2015-11-03),

12. 9046795 - Optical element unit for exposure processes having sealing element (2015-06-02),

13. 8939587 - Lens module comprising at least one exchangeable optical element (2015-01-27),

14. 8659745 - Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations (2014-02-25),

15. 8542346 - Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations (2013-09-24),

Title: Guido Limbach: Pioneering Innovation in the World of Inventions

Introduction: Guido Limbach, a visionary inventor based in Aalen, Germany, has captivated the world with his passion for innovation and unwavering commitment to pushing the boundaries of what is possible in the realm of inventions.

Latest Patents: Among his impressive portfolio of 18 patents, Guido Limbach's most recent innovation includes the development of an EUV exposure apparatus with reflective elements that significantly reduce the influence of temperature variation. This groundbreaking invention showcases his expertise in optical technology and his dedication to advancing lithographic projection systems.

Career Highlights: With a rich history working at leading companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V., Guido Limbach has honed his skills and expertise in the field of precision engineering and optics. His relentless pursuit of perfection and innovative mindset have been instrumental in shaping the future of technological advancements in the industry.

Collaborations: Throughout his illustrious career, Guido Limbach has collaborated with esteemed colleagues such as Stefan Hembacher and Julian Kaller. Together, they have pushed the boundaries of invention and collectively contributed to pioneering solutions that have had a lasting impact on the field of optics and lithography.

Conclusion: Guido Limbach's unwavering dedication to innovation and his remarkable contributions to the world of inventions have solidified his position as a prominent figure in the industry. His innovative spirit continues to inspire future generations of inventors to think creatively, experiment boldly, and pursue their ideas with passion and determination.

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1 patent pending:

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3 patents (EPO):

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3 patents pending (EPO):

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