Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Carl-zeiss-smt Ag

Guido Limbach

Stefan Hembacher

Julian Kaller

Ulrich Loering

Jens Kugler

Norman Baer

Harald Woelfle

Gero Wittich

Markus Hauf

Bernhard Gellrich

Timo Laufer

Holger Walter

Franz-Josef Stickel

Oliver Natt

Guido Soyez

Yim-Bun-Patrick Kwan

Jan Van Schoot

Stephan Back

Peter Kuerz

Joachim Buechele

Bernhard Geuppert

Armin Schoeppach

Hans-Juergen Scherle

Ulrich Weber

Stefan Xalter

Aksel Goehnermeier

Franz Sorg

Dirk Schaffer

Dirk Hellweg

Ulrich Bingel

Tilman Schwertner

Peter Meyer

Rolf Freimann

Thomas Schletterer

Peter Deufel

Thure Boehm

Dieter Schmerek

Detlev Mueller

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

Optical element unit for exposure processes

An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.

Lens module comprising at least one exchangeable optical element

A mirror (') with a substrate (S) and a layer arrangement configured such that light () having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0&#xb0; and 30&#xb0; is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P&#x2032;&#x2033;) having a periodic sequence of at least two periods (P) of individual layers, wherein the periods (P) include a high refractive index layer (H&#x2032;&#x2033;) and a low refractive index layer (L&#x2032;&#x2033;). The layer arrangement has at least one graphene layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective

A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.

Method for replacing objective parts

An optical module, in particular for microlithography, with an optical element unit, a support device, a deformation device and a measuring device is disclosed. The support device is supported on the optical element unit, whereas for deforming an optical surface of the optical element unit, the deformation device engages a deformation section of the optical element unit comprising the optical surface. For determining the position and/or the orientation of the optical element unit with respect to an external reference in at least one degree of freedom, the measuring device comprises at least one measuring element, wherein the measuring element is arranged on a reference section of the optical element unit.

Optical module with a measuring device

An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

Optical element unit for exposure processes having sealing element

An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. Alternatively or in addition, the optical system has a gas lock that receives the optical element. The opening interconnects the gas lock and the receiving region of the housing, and accommodates passage of the optical element between the gas lock and the receiving region.

The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Growing community of inventors

Aalen, Germany

Guido Limbach