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Aalen, Germany

Franz-Josef Stickel

This inventor holds 15 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignees: Carl Zeiss Smt Gmbh, Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2004-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Franz-Josef Stickel. Retrieved from https://idiyas.com/inventor/franz-josef-stickel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 80.0

 

Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 28(Granted Patents)


Location History:

  • Oberkochen, DE (2004 - 2009)
  • Aalen, DE (2012 - 2020)
  • Aalen-Unterrombach, DE (2018 - 2024)

Company Filing History:

goldMedal13 out of 1,479 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal5 out of 5,075 
 
Asml Netherlands B.v.
 patents
bronzeMedal2 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2004-2024

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15 patents (USPTO):Explore Patents
1. 11980990 - Method for machining a workpiece in the production of an optical element (2024-05-14),
2. 11213926 - Method for polishing a workpiece in the production of an optical element (2022-01-04),
3. 10831114 - Lithography apparatus and method (2020-11-10),
4. 10684551 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2020-06-16),
5. 10317802 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2019-06-11),
6. 10146138 - Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus (2018-12-04),
7. 10031423 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2018-07-24),
8. 9921483 - Surface correction of mirrors with decoupling coating (2018-03-20),
9. 9746778 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2017-08-29),
10. 9568845 - Mirror for use in a microlithography projection exposure apparatus (2017-02-14),
11. 9316929 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2016-04-19),
12. 9249501 - Surface correction on coated mirrors (2016-02-02),
13. 8228483 - Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate (2012-07-24),
14. 7551361 - Lithography lens system and projection exposure system provided with at least one lithography lens system of this type (2009-06-23),
15. 6831794 - Objective with at least one aspheric lens (2004-12-14),

Title: Innovator Spotlight: Franz-Josef Stickel

Introduction:

Franz-Josef Stickel is a distinguished inventor known for his groundbreaking work in the field of technology. His relentless dedication to innovation and sustainability has set him apart as a visionary in the world of inventors.

Latest Patents:

1. Method for polishing a workpiece in the production of an optical element: Stickel's method involves a unique approach to polishing workpieces for microlithography, using a viscoelastic polishing medium to achieve precise results.

2. Lithography apparatus and method: Stickel's lithography machine features an optical element with a form-fitting interface, showcasing his innovative design solutions.

Career Highlights:

With an impressive portfolio of 14 patents, Franz-Josef Stickel has made significant contributions to the field of technology. His work at renowned companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. has been instrumental in pushing the boundaries of innovation.

Collaborations:

Throughout his career, Stickel has collaborated with talented individuals such as Ulrich Loering and Oliver Natt. Their collective expertise has led to the development of cutting-edge technologies and solutions in the tech industry.

Conclusion:

In conclusion, Franz-Josef Stickel's visionary approach to technology and commitment to excellence make him a leading figure in the world of inventors. His innovative spirit continues to inspire future generations and shape the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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