The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Aug. 19, 2020
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Andreas Wolpert, Ellwangen, DE;
Franz-Josef Stickel, Aalen-Unterrombach, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A method for polishing a workpiece in the production of an optical element, in particular for microlithography, wherein a relative movement takes place between a polishing tool () and a workpiece surface () being machined. A polishing tool surface () of the polishing tool () is formed by a viscoelastic polishing medium (), wherein the polishing tool surface has an average diameter which is less than 50% of the average diameter of the workpiece surface being machined. The polishing tool surface during polishing is guided by an overrun distance beyond at least one edge () delimiting the workpiece surface being machined, wherein the average diameter of the polishing tool surface is at least twice the overrun distance.