The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
May. 18, 2012
Dirk Heinrich Ehm, Lauchheim, DE;
Franz-josef Stickel, Aalen, DE;
Juergen Mueller, Ulm, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A mirror () for a microlithography projection exposure apparatus including a substrate () and a reflective coating (). A functional coating () between the substrate () and the reflective coating () has a local form variation () for correcting the surface form of the mirror (), wherein the local form variation () is brought about by a local variation in the chemical composition of the functional coating () and wherein a thickness of the reflective coating () is not changed by the local variation in the chemical composition of the functional coating (). The local variation in the chemical composition of the functional coating () can be brought about by bombardment with particles (), for example with hydrogen ions.