The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2009

Filed:

Jul. 14, 2004
Applicants:

Hans-juergen Rostalski, Oberkochen, DE;

Alexander Epple, Aalen, DE;

Aurelian Dodoc, Oberkochen, DE;

Johannes Wangler, Koenigsbronn, DE;

Karl-heinz Schuster, Koenigsbronn, DE;

Joerg Schultz, Aalen, DE;

Franz-josef Stickel, Oberkochen, DE;

Wolfgang Singer, Aalen, DE;

Joachim Wietzorrek, Berlin, DE;

Inventors:

Hans-Juergen Rostalski, Oberkochen, DE;

Alexander Epple, Aalen, DE;

Aurelian Dodoc, Oberkochen, DE;

Johannes Wangler, Koenigsbronn, DE;

Karl-Heinz Schuster, Koenigsbronn, DE;

Joerg Schultz, Aalen, DE;

Franz-Josef Stickel, Oberkochen, DE;

Wolfgang Singer, Aalen, DE;

Joachim Wietzorrek, Berlin, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.


Find Patent Forward Citations

Loading…