The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Dec. 28, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Oliver Dier, Lauchheim, DE;
Tobias Hackl, Langenau, DE;
Franz-Josef Stickel, Aalen-Unterrombach, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Tilmann Assmus, Aalen, DE;
Juergen Mueller, Ulm, DE;
Vladimir Kamenov, Essingen, DE;
Siegfried Rennon, Westhausen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A mirror () for EUV lithography includes a substrate () and a reflective coating (). The reflective coating has a first group () of layers () and a second group () of layers (), wherein the first group and second group of layers () reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating () is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer () having a layer thickness variation for correcting the surface form of the mirror.