Location History:
- Wuerzburg, DE (2011 - 2014)
- Westhausen, DE (2018)
Company Filing History:
Years Active: 2011-2018
Title: The Innovative Contributions of Siegfried Rennon in EUV Lithography
Introduction
Siegfried Rennon, an accomplished inventor based in Wuerzburg, Germany, has made significant strides in the field of EUV lithography. With a total of four patents to his name, his inventions focus on enhancing the efficiency and effectiveness of optical systems used in high-precision applications.
Latest Patents
Rennon's latest patents showcase his expertise in surface correction techniques for mirrors, specifically tailored for EUV lithography.
One notable patent describes a mirror that includes a substrate and a reflective coating. The reflective coating is distinguished by two groups of layers that effectively reflect radiation with wavelengths ranging between 5 nm and 30 nm. A decoupling coating is strategically placed between these layers to optically separate them, ensuring that the radiation does not interfere with the first group of layers. Additionally, a correction layer with variable thickness is introduced to refine the mirror's surface form.
Another important patent involves a projection objective for a microlithographic EUV projection exposure apparatus. This design features two mirrors with specific reflective coatings. The innovative configuration allows for distinct compaction behaviors under EUV light, enhancing the overall performance of the lithography system.
Career Highlights
Siegfried Rennon has enjoyed a distinguished career, having worked with prestigious companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His roles in these organizations have allowed him to contribute to cutting-edge advancements in optical technologies, particularly in the realm of lithography.
Collaborations
Throughout his career, Rennon has collaborated with talented individuals, including Oliver Wolf and Heiko Siekmann. Their combined expertise has likely influenced the development of innovative solutions that push the boundaries of current technologies in their field.
Conclusion
Siegfried Rennon's inventive spirit and technical prowess have led to groundbreaking advancements in EUV lithography. His patents reflect a commitment to improving the precision and functionality of optical systems. Through collaboration with esteemed colleagues and his work at renowned companies, he continues to leave an indelible mark on the field of innovation and technology.