Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Siegfried Rennon

Johannes Wangler

Nils Haverkamp

Michael Layh

Michael Gerhard

Axel Scholz

Ralf Scharnweber

Heiko Siekmann

Stefan Burkart

Andre Bresan

Eva Kalchbrenner

Oliver Wolf

Hans-Juergen Mann

Ulrich Loering

Thomas Schicketanz

Vladimir Kamenov

Franz-Josef Stickel

Oliver Dier

Juergen Mueller

Tobias Hackl

Tilmann Assmus

Tilmann AßMUS

Ulrich LÖRING

Jürgen MÜLLER

A mirror () for EUV lithography includes a substrate () and a reflective coating (). The reflective coating has a first group () of layers () and a second group () of layers (), wherein the first group and second group of layers () reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating () is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer () having a layer thickness variation for correcting the surface form of the mirror.

Surface correction of mirrors with decoupling coating

A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.

Projection objective for a microlithographic EUV projection exposure apparatus

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

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Wuerzburg, Germany

Siegfried Rennon