The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Dec. 20, 2010
Oliver Wolf, Aalen, DE;
Heiko Siekmann, Aalen, DE;
Eva Kalchbrenner, Bopfingen, DE;
Siegfried Rennon, Wuerzburg, DE;
Johannes Wangler, Koenigsbronn, DE;
Andre Bresan, Aalen, DE;
Michael Gerhard, Aalen, DE;
Nils Haverkamp, Oberkochen, DE;
Axel Scholz, Aalen, DE;
Ralf Scharnweber, Aalen, DE;
Michael Layh, Aalen, DE;
Stefan Burkart, Heidenheim, DE;
Oliver Wolf, Aalen, DE;
Heiko Siekmann, Aalen, DE;
Eva Kalchbrenner, Bopfingen, DE;
Siegfried Rennon, Wuerzburg, DE;
Johannes Wangler, Koenigsbronn, DE;
Andre Bresan, Aalen, DE;
Michael Gerhard, Aalen, DE;
Nils Haverkamp, Oberkochen, DE;
Axel Scholz, Aalen, DE;
Ralf Scharnweber, Aalen, DE;
Michael Layh, Aalen, DE;
Stefan Burkart, Heidenheim, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.