Aalen, Germany

Ralf Scharnweber


 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2009-2018

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10 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ralf Scharnweber

Introduction

Ralf Scharnweber, an accomplished inventor based in Aalen, Germany, has made significant strides in the field of microlithography. With a portfolio comprising ten patents, his work focuses on refining optical systems and enhancing illumination technologies for projection exposure apparatuses.

Latest Patents

Among his latest patents, Scharnweber has developed an optical system for a microlithographic projection exposure apparatus. This invention features a mirror arrangement with multiple independently displaceable mirror elements that can alter the angular distribution of reflected light. Additionally, he has created a microlithographic exposure method that incorporates a manipulator positioned downstream of the mirror arrangement. This manipulator contains a raster arrangement of elements designed to influence the polarization state and intensity of incident light based on its incidence location.

Another notable patent pertains to illumination systems for microlithographic projection exposure apparatuses. This innovation includes scattering structures and an optical integrator designed to produce several secondary light sources, which enhances the overall functionality and efficiency of microlithographic systems.

Career Highlights

Ralf Scharnweber's professional journey has seen him contribute to prestigious companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG, where he has applied his expertise in optics and illumination systems. His work has played a critical role in advancing technology within these enterprises, particularly in the field of high-precision manufacturing.

Collaborations

Throughout his career, Scharnweber has collaborated with notable coworkers, including Johannes Wangler and Heiko Siekmann. These partnerships have fostered innovation and have been instrumental in the development of groundbreaking optical technologies that are essential to the industry.

Conclusion

Ralf Scharnweber’s contributions to microlithography and optical systems exemplify the impact of innovative thinking in technology. His ten patents underscore his commitment to advancing the field and facilitating the growth of sophisticated manufacturing processes. As technology continues to evolve, inventors like Scharnweber stand at the forefront, driving progress and inspiring future generations of engineers and inventors.

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