Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Ralf Scharnweber

Johannes Wangler

Michael Layh

Axel Scholz

Heiko Siekmann

Markus Deguenther

Manfred Maul

Reinhard Voelkel

Kenneth Weible

Uwe Spengler

Nils Haverkamp

Michael Gerhard

Severin Waldis

Siegfried Rennon

Stefan Burkart

Andre Bresan

Oliver Wolf

Eva Kalchbrenner

Toralf Gruner

Damian Fiolka

Markus Hauf

Udo Dinger

Martin Endres

Joachim Hartjes

Ingo Saenger

Thomas Korb

Berndt Warm

Andras G Major

Olaf Dittmann

Ralf Stuetzle

Jens Ossmann

Gundula Weiss

Marc Kirch

Martin Vogt

Christian Steigerwald

Reinhard Völkel

An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Illumination system for a microlithographic projection exposure apparatus

In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system (), and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system () spatially separated from the first projection system (). The projection systems are integrated in a common projection exposure installation (). The first exposure can be carried out, for example, with an amplitude mask (), the second exposure with a phase mask (). The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.

Method for a multiple exposure, microlithography projection exposure installation and a projection system

Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Illumination optics for EUV microlithography and related system and apparatus

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system, and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system spatially separated from the first projection system. The projection systems are integrated in a common projection exposure installation. The first exposure can be carried out, for example, with an amplitude mask, the second exposure with a phase mask. The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.

Growing community of inventors

Aalen, Germany

Ralf Scharnweber