The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Feb. 06, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Johannes Wangler, Koenigsbronn, DE;
Heiko Siekmann, Aalen, DE;
Kenneth Weible, Neuchatel, CH;
Ralf Scharnweber, Aalen, DE;
Manfred Maul, Aalen, DE;
Markus Deguenther, Aalen, DE;
Michael Layh, Altusried, DE;
Axel Scholz, Aalen, DE;
Uwe Spengler, Treuchtlingen, DE;
Reinhard Voelkel, Neuchatel, CH;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70058 (2013.01); G03F 7/70075 (2013.01); G03F 7/70083 (2013.01); G03F 7/70158 (2013.01);
Abstract
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.