Kenneth Weible

Title: The Innovations of Kenneth Weible

Introduction

Kenneth Weible is a notable inventor based in Neuchatel, Switzerland. He has made significant contributions to the field of microlithography, particularly in the development of illumination systems for projection exposure apparatuses. With a total of four patents to his name, Weible's work has had a considerable impact on the industry.

Latest Patents

Among his latest patents is an illumination system for a microlithographic projection exposure apparatus. This patent discloses illumination systems for microlithographic projection exposure apparatuses, along with related systems, components, and methods. In some embodiments, the illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources. This innovation enhances the efficiency and effectiveness of microlithographic processes.

Career Highlights

Kenneth Weible is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and technologies. His work at this esteemed organization has allowed him to further develop his innovative ideas and contribute to advancements in microlithography.

Collaborations

Throughout his career, Weible has collaborated with several talented individuals, including Reinhard Voelkel and Johannes Wangler. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Kenneth Weible's contributions to microlithography through his innovative patents and work at Carl Zeiss SMT GmbH highlight his importance as an inventor in the industry. His advancements in illumination systems continue to influence the field and pave the way for future innovations.