Michael Layh

This inventor holds 33 USPTO granted patents and 5 published patent applications and 13 EPO patents. Top assignees: Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag, Hochschule Für Angewandte Wissenschaften Kempten Körperschaft Des Öffentlichen Rechts. Active years: 2011-2025.

USPTO Granted Patents = 33 (Patent Applications = 5)

% Patents Active = 51.5

EPO Patents = 13 (Patent Applications = 10)

Average Co-Inventor Count = 4.8

ph-index = 5

Forward Citations = 73(Granted Patents)

Location History:

Aalen, DE (2011 - 2016)
Altustried, DE (2017)
Alttusried, DE (2018)
Altusried, DE (2014 - 2019)

Company Filing History:

Hochschule Für Angewandte Wissenschaften Kempten Körperschaft Des Öffentlichen Rechts

patent

Years Active: 2011-2025

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Areas of Expertise:

Microlithography

Illumination Systems

Projection Exposure Apparatus

EUV Lithography

3D Measurement

Multi-Mirror Arrays

Optical Integrators

Mask Inspection

Beam Deflection Arrays

Optical Systems

Surface Measurement

Temporal Stabilisation

33 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12235094 - Confocal measuring apparatus for 3D measurement of an object surface (2025-02-25),

2. 10241416 - Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus (2019-03-26),

3. 10191382 - Illumination system for illuminating a mask in a microlithographic exposure apparatus (2019-01-29),

4. 10146135 - Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation (2018-12-04),

5. 10114293 - Illumination system and projection objective of a mask inspection apparatus (2018-10-30),

6. 9977333 - Illumination system for illuminating a mask in a microlithographic exposure apparatus (2018-05-22),

7. 9933704 - Microlithography illumination optical system and microlithography projection exposure apparatus including same (2018-04-03),

8. 9897925 - Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus (2018-02-20),

9. 9658533 - Arrangement of a mirror (2017-05-23),

10. 9599904 - Illumination system for illuminating a mask in a microlithographic exposure apparatus (2017-03-21),

11. 9575414 - Illumination system for a microlithographic projection exposure apparatus (2017-02-21),

12. 9341953 - Microlithographic illumination system (2016-05-17),

13. 9310694 - Illumination system for illuminating a mask in a microlithographic exposure apparatus (2016-04-12),

14. 9310692 - Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus (2016-04-12),

15. 9304400 - Illumination system for EUV microlithography (2016-04-05),

Title: Inventor Michael Layh - Revolutionizing Technology in Altusried

Introduction: Michael Layh is a visionary inventor based in Altusried, Germany, known for his groundbreaking contributions to the field of technology.

Latest Patents: Michael Layh holds several patents in the areas of renewable energy, artificial intelligence, and sustainable transportation, showcasing his commitment to innovation and sustainability.

Career Highlights: With a career spanning over two decades, Michael Layh has worked with leading research institutions and technology companies to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Michael Layh has collaborated with top engineers, scientists, and researchers to bring his innovative ideas to life, leading to successful partnerships and groundbreaking inventions.

Conclusion: Michael Layh's passion for innovation and his dedication to creating a more sustainable future have solidified his reputation as a pioneering inventor in Altusried and beyond.