The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

Aug. 16, 2012
Applicants:

Heiko Feldmann, Aalen, DE;

Erik Matthias Sohmen, Aalen, DE;

Joachim Stuehler, Aalen, DE;

Oswald Gromer, Heidenheim, DE;

Ulrich Mueller, Aalen, DE;

Michael Layh, Alttusried, DE;

Markus Schwab, Aalen, DE;

Inventors:

Heiko Feldmann, Aalen, DE;

Erik Matthias Sohmen, Aalen, DE;

Joachim Stuehler, Aalen, DE;

Oswald Gromer, Heidenheim, DE;

Ulrich Mueller, Aalen, DE;

Michael Layh, Alttusried, DE;

Markus Schwab, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01N 21/956 (2006.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70091 (2013.01); G01N 21/956 (2013.01); G03F 1/84 (2013.01); G01N 2021/95676 (2013.01);
Abstract

An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.


Find Patent Forward Citations

Loading…