Heidenheim, Germany

Oswald Gromer

USPTO Granted Patents = 7 


Average Co-Inventor Count = 5.8

ph-index = 3

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2008-2018

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Oswald Gromer

Introduction

Oswald Gromer, based in Heidenheim, Germany, is an accomplished inventor known for his significant contributions to the field of microlithography and optical systems. With a total of seven patents to his name, Gromer's work has greatly advanced technologies used in semiconductor manufacturing and inspection.

Latest Patents

Among his latest innovations are two notable patents that focus on illumination systems and projection optics. The first patent details an "Illumination system and projection objective of a mask inspection apparatus." This invention enhances the functionality of mask inspection by utilizing an illumination bundle of rays with a centroid ray dependant on the mask's incidence location. The second patent is for a "Projection exposure system for microlithography with a measurement device." This technology incorporates a mask holding device, substrate holding device, and integrated measurement structure that allows for simultaneous imaging of both mask structures and measurement structures during operation, thereby improving the accuracy and efficiency of the exposure process.

Career Highlights

Oswald Gromer has had a distinguished career, working with prestigious organizations such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His experience in these companies has played a pivotal role in shaping his engineering and inventive capabilities, allowing him to make significant advancements in optical systems.

Collaborations

Throughout his career, Gromer has collaborated with notable professionals in his field, including Joachim Stuehler and Ulrich Mueller. These collaborations have likely contributed to the innovative nature of his inventions and success in patenting cutting-edge technologies.

Conclusion

Oswald Gromer's contributions to microlithography and optical engineering illustrate his dedication to innovation and excellence. With his seven patents, Gromer continues to influence advancements in the semiconductor industry, reinforcing the importance of ingenuity in technological progress.

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