The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Oct. 08, 2004
Michael Arnz, Oberkochen, DE;
Oswald Gromer, Heidenheim, DE;
Gerd Klose, Oberkochen, DE;
Joachim Stuehler, Aalen, DE;
Matthias Manger, Aalen, DE;
Michael Arnz, Oberkochen, DE;
Oswald Gromer, Heidenheim, DE;
Gerd Klose, Oberkochen, DE;
Joachim Stuehler, Aalen, DE;
Matthias Manger, Aalen, DE;
Carl Zeiss SMT AG, Oerkochen, DE;
Abstract
An illumination mask () for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures () which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone () in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.