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Michael Arnz

USPTO Granted Patents = 20 (Patent Applications = 1)

EPO Patents = 3 (Patent Applications = 3)

Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 37(Granted Patents)

Company Filing History:

Carl Zeiss Meditec Ag

patents

where one patent can have more than one assignee

Years Active: 2004-2018

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10113864 - Method for determining the registration of a structure on a photomask and apparatus to perform the method (2018-10-30),

2. 10012911 - Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator (2018-07-03),

3. 9797805 - Test object for measuring the point spread function of an optical system (2017-10-24),

4. 9786046 - Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position (2017-10-10),

5. 9377415 - Measuring device for measuring an illumination property (2016-06-28),

6. 9303975 - Method for determining the registration of a structure on a photomask and apparatus to perform the method (2016-04-05),

7. 9297994 - Grating-assisted autofocus device and autofocusing method for an imaging device (2016-03-29),

8. 9229209 - Autofocus device and autofocusing method for an imaging device (2016-01-05),

9. 9014505 - Method and device for determining the position of a first structure relative to a second structure or a part thereof (2015-04-21),

10. 8731273 - Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section (2014-05-20),

11. 8694929 - Method and apparatus for the position determination of structures on a mask for microlithography (2014-04-08),

12. 8693805 - Determination of the relative position of two structures (2014-04-08),

13. 8473237 - Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage (2013-06-25),

14. 8457411 - Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure (2013-06-04),

15. 8369605 - Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier (2013-02-05),

Title: Innovations by Michael Arnz: Pioneering Patents in Photomask Technology

Introduction: Michael Arnz, an accomplished inventor based in Oberkochen, Germany, has made significant contributions to the field of photomask technology, amassing a remarkable portfolio of 20 patents. His inventive prowess is encapsulated in his latest patents, which showcase innovative methods and apparatuses designed to enhance precision in optical projection systems.

Latest Patents: Among Michael Arnz's latest patents is a groundbreaking method for determining the registration of a structure on a photomask. This method determines the registration error of a feature by capturing a first aerial image via a position measuring device that includes the feature. It remarkably simulates a second aerial image derived from the mask’s pattern specifications, accounting for distortions observed in the first aerial image. This inventive approach promises to improve accuracy in photomask registration processes significantly.

Another notable patent is the projection exposure apparatus equipped with a wavefront measuring device and an optical wavefront manipulator. This apparatus integrates a projection lens, wavefront manipulator, and a sophisticated wavefront measuring device featuring a Moiré grating arrangement. This arrangement is designed to be positioned in an object and image plane, enabling simultaneous generation of Moiré superimposition patterns for multiple field points. Such innovations are critical for advancing the capabilities of modern photolithography.

Career Highlights: Michael has had a notable career working with prestigious organizations such as Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. His role in these companies has allowed him to explore and develop advanced optical technologies, culminating in a diverse array of patents that continue to impact the industry.

Collaborations: Throughout his career, Michael has collaborated with talented coworkers like Gerd Klose and Dirk Seidel. These partnerships have fostered an environment of creativity and innovation, further enhancing the impact of his inventions on the photomask technology landscape.

Conclusion: Michael Arnz stands out as a prominent figure in the realm of innovations related to photomask technologies. His array of patents reflects a deep understanding of optical systems and a commitment to advancing this vital field. As technology continues to evolve, his contributions will undoubtedly play a crucial role in shaping the future of optical projection methodologies.

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