The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Nov. 28, 2009
Michael Arnz, Oberkochen, DE;
Dirk Beyer, Weimar, DE;
Wolfgang Harnisch, Lehesten, DE;
Thomas Scheruebl, Jena, DE;
Michael Arnz, Oberkochen, DE;
Dirk Beyer, Weimar, DE;
Wolfgang Harnisch, Lehesten, DE;
Thomas Scheruebl, Jena, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.