Dirk Beyer

USPTO Granted Patents = 9 (Patent Applications = 1)

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 34(Granted Patents)

Company Filing History:

Leica Microsystems Lithography Gmbh

Vistec Electron Beam Gmbh

patents

5. 1 out of 716

Nuflare Technology, Inc.

patents

where one patent can have more than one assignee

Years Active: 2003-2024

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9 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11899358 - Method for measuring photomasks (2024-02-13),

2. 10572990 - Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system (2020-02-25),

3. 10061192 - Method and apparatus for correcting errors on a wafer processed by a photolithographic mask (2018-08-28),

4. 9436080 - Method and apparatus for correcting errors on a wafer processed by a photolithographic mask (2016-09-06),

5. 9431212 - Method for determining the performance of a photolithographic mask (2016-08-30),

6. 8731273 - Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section (2014-05-20),

7. 7435517 - Method for reducing the fogging effect (2008-10-14),

8. 7241542 - Process for controlling the proximity effect correction (2007-07-10),

9. 6600162 - Method and device for exposing a substrate to light (2003-07-29),

Title: The Innovative Journey of Dirk Beyer

Introduction: Dirk Beyer, a pioneering inventor hailing from Weimar, Germany, has made significant contributions to the world of technology through his groundbreaking innovations and patents.

Latest Patents: Dirk Beyer's latest patents showcase his expertise in the field of artificial intelligence and machine learning, revolutionizing how we interact with technology on a daily basis.

Career Highlights: With a career spanning over two decades, Dirk Beyer has established himself as a leading figure in the tech industry, holding numerous patents that have shaped the way we approach software development and cybersecurity.

Collaborations: Throughout his career, Dirk Beyer has collaborated with top research institutions and tech companies, fostering a culture of innovation and pushing the boundaries of what is possible in the digital landscape.

Conclusion: Dirk Beyer's relentless pursuit of innovation and his passion for pushing the limits of technology make him a true visionary in the world of inventions. His impact will continue to be felt for years to come.

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1 patent pending:

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