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Vistec Electron Beam Gmbh

USPTO Granted Patents = 10

EPO Patents = 11

Trademarks = 2

Forward Citations = 154

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33 inventors (with patents filed for the assignee):

Hans-Joachim Doering (4 out of 5 patents)

Thomas Peschel (3 out of 18 patents)

Stefan Risse (3 out of 13 patents)

4. Gerd Harnisch (3 out of 6 patents)

5. Gerhard Schubert (3 out of 6 patents)

6. Christian Jackel (3 out of 3 patents)

7. Ulf-Carsten Kirschstein (3 out of 6 patents)

8. Michael Boehm (3 out of 3 patents)

9. René Bauer (3 out of 3 patents)

10. Christoph Schenk (3 out of 4 patents)

11. Thomas Elster (3 out of 6 patents)

12. Joachim Heinitz (2 out of 3 patents)

13. Christian Borschel (1 out of 1 patent)

14. Wittich Kaule (1 out of 87 patents)

15. Dirk Beyer (1 out of 9 patents)

10 patents: Sort by Forward Citations

1. 10814361 - Particle beam apparatus and method for operating a particle beam apparatus (2020-10-27),

2. 8529130 - Aerostatic bearing arrangement and associated electrostatic preloading unit, particularly for vacuum application (2013-09-10),

3. 8496221 - Aerostatically guided table system for vacuum application (2013-07-30),

4. 8267582 - Table guided by aerostatic bearing elements for vacuum application (2012-09-18),

5. 8148702 - Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns (2012-04-03),

6. 7880152 - Device and method for producing resist profiled elements (2011-02-01),

7. 7741620 - Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate (2010-06-22),

8. 7601969 - Illumination condenser for a particle optical projection system (2009-10-13),

9. 7560713 - Correction lens system for a particle beam projection device (2009-07-14),

10. 7435517 - Method for reducing the fogging effect (2008-10-14),

Vistec Electron Beam GmbH is a leading provider of electron-beam lithography systems for the semiconductor and nanotechnology industries. Their advanced tools enable customers to create high-resolution patterns on substrates and are widely used in research and development. With a strong focus on innovation and customer satisfaction, Vistec Electron Beam GmbH continues to push the boundaries of electron-beam technology.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 9 2025

10 Patents

#33 in

#3,713 in Germany

#54,238 in the World

Vistec Electron Beam Gmbh

Forward Citations = 154

33 inventors:

Hans-Joachim Doering (4 out of 5 patents)

Thomas Peschel (3 out of 18 patents)

Stefan Risse (3 out of 13 patents)

4. Gerd Harnisch (3 out of 6 patents)

5. Gerhard Schubert (3 out of 6 patents)

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