The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Dec. 10, 2009
Hans-joachim Doering, Jena, DE;
Thomas Elster, Jena, DE;
Joachim Heinitz, Jena, DE;
Matthias Slodowski, Jena, DE;
Hans-Joachim Doering, Jena, DE;
Thomas Elster, Jena, DE;
Joachim Heinitz, Jena, DE;
Matthias Slodowski, Jena, DE;
Vistec Electron Beam GmbH, Jena, DE;
Abstract
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.