Jena, Germany

Hans-Joachim Doering



Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 143(Granted Patents)


Company Filing History:


Years Active: 2009-2012

Loading Chart...
Loading Chart...
5 patents (USPTO):Explore Patents

Title: The Innovations of Hans-Joachim Doering

Introduction

Hans-Joachim Doering is a notable inventor based in Jena, Germany. He has made significant contributions to the field of lithography, particularly in the semiconductor industry. With a total of 5 patents to his name, his work focuses on enhancing the precision and efficiency of particle beam technologies.

Latest Patents

One of his latest patents is an arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns. This invention aims to provide a novel method for illuminating substrates using controllable particle beamlets, allowing for high-resolution structuring without compromising substrate throughput. Another significant patent is the multi-beam modulator for a particle beam, which generates multiple individual beams from a single particle beam. This modulator is designed to illuminate the substrate effectively, utilizing a matrix of aperture groups to enhance the structuring process.

Career Highlights

Throughout his career, Hans-Joachim Doering has worked with prominent companies in the field, including Vistec Electron Beam GmbH and Leica Microsystems Lithography GmbH. His expertise in particle beam technology has positioned him as a key figure in advancing lithographic techniques.

Collaborations

He has collaborated with notable colleagues such as Thomas Elster and Joachim Heinitz, contributing to various projects that push the boundaries of current technologies.

Conclusion

Hans-Joachim Doering's innovative work in particle beam technology and lithography has made a lasting impact on the semiconductor industry. His patents reflect a commitment to enhancing precision and efficiency in manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…