This inventor holds 5 USPTO granted patents and 2 EPO patents. Top assignees: Vistec Electron Beam Gmbh, Leica Microsystems Lithography Gmbh. Active years: 2009-2012.
Company Filing History:
4 out of 10 
1 out of 20 Years Active: 2009-2012
Title: The Innovations of Hans-Joachim Doering
Introduction
Hans-Joachim Doering is a notable inventor based in Jena, Germany. He has made significant contributions to the field of lithography, particularly in the semiconductor industry. With a total of 5 patents to his name, his work focuses on enhancing the precision and efficiency of particle beam technologies.
Latest Patents
One of his latest patents is an arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns. This invention aims to provide a novel method for illuminating substrates using controllable particle beamlets, allowing for high-resolution structuring without compromising substrate throughput. Another significant patent is the multi-beam modulator for a particle beam, which generates multiple individual beams from a single particle beam. This modulator is designed to illuminate the substrate effectively, utilizing a matrix of aperture groups to enhance the structuring process.
Career Highlights
Throughout his career, Hans-Joachim Doering has worked with prominent companies in the field, including Vistec Electron Beam GmbH and Leica Microsystems Lithography GmbH. His expertise in particle beam technology has positioned him as a key figure in advancing lithographic techniques.
Collaborations
He has collaborated with notable colleagues such as Thomas Elster and Joachim Heinitz, contributing to various projects that push the boundaries of current technologies.
Conclusion
Hans-Joachim Doering's innovative work in particle beam technology and lithography has made a lasting impact on the semiconductor industry. His patents reflect a commitment to enhancing precision and efficiency in manufacturing processes.