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Leica Microsystems Lithography Gmbh

USPTO Granted Patents = 20

Forward Citations = 86

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49 inventors (with patents filed for the assignee):

Gerhard Schubert (3 out of 6 patents)

Thomas Elster (3 out of 6 patents)

Stefan Risse (2 out of 13 patents)

4. Nigel Crosland (2 out of 3 patents)

5. Dirk Beyer (2 out of 9 patents)

6. John Tingay (2 out of 6 patents)

7. Ulf-Carsten Kirschstein (2 out of 6 patents)

8. Paul George Harris (2 out of 3 patents)

9. Rainer Plontke (2 out of 3 patents)

10. Ines Stolberg (2 out of 3 patents)

11. Andreas Schubert (2 out of 3 patents)

12. Michael Blume (2 out of 2 patents)

13. Peter Hahmann (2 out of 2 patents)

14. Volker Guyenot (1 out of 9 patents)

15. Thomas Peschel (1 out of 18 patents)

20 patents: Sort by Forward Citations

1. 7783377 - Substrate loading and unloading apparatus (2010-08-24),

2. 7491946 - Electrostatic deflection system for corpuscular radiation (2009-02-17),

3. 7332730 - Device and method for imaging a multiple particle beam on a substrate (2008-02-19),

4. 7241542 - Process for controlling the proximity effect correction (2007-07-10),

5. 7053388 - Dual-mode electron beam lithography machine (2006-05-30),

6. 7019308 - Thermal compensation in magnetic field influencing of an electron beam (2006-03-28),

7. 6998621 - Cooling of a device for influencing an electron beam (2006-02-14),

8. 6885009 - Device for influencing an electron beam (2005-04-26),

9. 6781140 - Method of and machine for pattern writing by an electron beam (2004-08-24),

10. 6774375 - Method and apparatus for forming a curved polyline on a radiation-sensitive resist (2004-08-10),

11. 6639225 - Six-axis positioning system having a zero-magnetic-field space (2003-10-28),

12. 6635884 - Method for directing an electron beam onto a target position on a substrate surface (2003-10-21),

13. 6635395 - Method for exposing a layout comprising multiple layers on a wafer (2003-10-21),

14. 6600162 - Method and device for exposing a substrate to light (2003-07-29),

15. 6541776 - Device for electrostatic deflection of a particle beam (2003-04-01),

Leica Microsystems Lithography GmbH is a leading manufacturer of microscopy and microfabrication equipment. We provide innovative solutions for the research, manufacturing, and inspection of semiconductors, microelectromechanical systems (MEMS), and other microstructures. Our cutting-edge lithography systems enable high-precision patterning and imaging at the nanoscale. With a global presence and a strong commitment to customer satisfaction, Leica Microsystems Lithography GmbH is trusted by industry leaders for their advanced microfabrication needs.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

20 Patents

#20 in Jena

#2,239 in Germany

#30,327 in the World

Leica Microsystems Lithography Gmbh

Forward Citations = 86

49 inventors:

Gerhard Schubert (3 out of 6 patents)

Thomas Elster (3 out of 6 patents)

Stefan Risse (2 out of 13 patents)

4. Nigel Crosland (2 out of 3 patents)

5. Dirk Beyer (2 out of 9 patents)

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