The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Sep. 14, 2001
Ulf-Carsten Kirschstein, Jenapriessnitz, DE;
Erik Beckert, Arnstadt, DE;
Andrew Hoffmann, Ilmenau, DE;
Christoph Schaeffel, Ilmenau, DE;
Eugen Saffert, Ilmenau, DE;
Johannes Zentner, Ilmenau, DE;
Torsten Gramsch, Ilmenau, DE;
Leica Microsystems Lithography GmbH, Jena, DE;
Abstract
The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system ( ), displaceable on a linear guidance system ( ), for receiving the substrate, the guidance direction of the linear guidance system ( ) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system ( ), including the retention system ( ), about the guidance direction; and drives for parallel displacement of the linear guidance system ( ), including the retention system ( ), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.