This inventor holds 1 USPTO granted patent. Top assignee: Leica Microsystems Lithography Gmbh. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: The Innovations of Eugen Saffert
Introduction
Eugen Saffert is a notable inventor based in Ilmenau, Germany. He has made significant contributions to the field of positioning systems, particularly in high-vacuum conditions. His work is characterized by a focus on precision and efficiency in substrate positioning.
Latest Patents
Eugen Saffert holds a patent for a "Six-axis positioning system having a zero-magnetic-field space." This invention pertains to an arrangement designed for positioning substrates, especially wafers, within devices used for exposure and measurement under high-vacuum conditions. The system includes a retention mechanism that is displaceable on a linear guidance system, with the guidance direction aligned parallel to the Y coordinate of an X, Y, Z spatial coordinate system. The invention also features drives that allow for limited modifications of inclination and rotation, as well as parallel displacement in multiple coordinate directions.
Career Highlights
Eugen Saffert is currently employed at Leica Microsystems Lithography GmbH, where he continues to innovate in the field of lithography and substrate positioning. His expertise has been instrumental in advancing technologies that require high precision and reliability.
Collaborations
Throughout his career, Saffert has collaborated with notable colleagues, including Ulf-Carsten Kirschstein and Erik Beckert. These collaborations have contributed to the development of cutting-edge technologies in the field.
Conclusion
Eugen Saffert's contributions to the field of positioning systems highlight his innovative spirit and dedication to advancing technology. His patent for a six-axis positioning system exemplifies the importance of precision in modern applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile