Company Filing History:
Years Active: 2003-2004
Title: Michael Blume: Innovator in Electron Beam Lithography
Introduction
Michael Blume is a notable inventor based in Jena, Germany. He has made significant contributions to the field of electron beam lithography, with a focus on methods and apparatuses that enhance the precision of forming polylines on substrates.
Latest Patents
Michael Blume holds two patents, showcasing his innovative work. His latest patents include a "Method and apparatus for forming a curved polyline on a radiation-sensitive resist." This method utilizes an electron beam directed onto a substrate coated with a radiation-sensitive resist. The substrate is displaced relative to the electron beam in individual steps, allowing for precise energy input based on the shape of the polyline. This technique is particularly effective for writing curved polylines. Another patent is for a "Method for directing an electron beam onto a target position on a substrate surface," which further demonstrates his expertise in this advanced technology.
Career Highlights
Michael Blume is currently employed at Leica Microsystems Lithography GmbH, where he continues to develop innovative solutions in the field of lithography. His work has been instrumental in advancing the capabilities of electron beam technology.
Collaborations
Michael collaborates with talented coworkers, including Rainer Plontke and Ines Stolberg, who contribute to the innovative environment at Leica Microsystems Lithography GmbH.
Conclusion
Michael Blume's contributions to electron beam lithography and his innovative patents highlight his role as a leading inventor in this specialized field. His work continues to influence advancements in technology and precision manufacturing.