Leica Microsystems Lithography Gmbh

Michael Blume

Ines Stolberg

Rainer Plontke

Andreas Schubert

Rainer Kaebsch

Matthias Zierbock

In a method for forming, with the aid of an electron beam ( ), a polyline on a substrate ( ) coated with a radiation-sensitive resist, the electron beam ( ) is directed onto a surface of the substrate ( ) in the direction of a Z coordinate, and the substrate ( ) is displaced relative to the electron beam ( ) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam ( ) acts with a predefined energy input on the substrate ( ) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.

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Jena, Germany

Michael Blume