The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Mar. 05, 2001
Rainer Plontke, Magdala, DE;
Andreas Schubert, Niederrossla, DE;
Michael Blume, Jena, DE;
Ines Stolberg, Jena, DE;
Leica Microsystems Lithography GmbH, Jena, DE;
Abstract
In a method for forming, with the aid of an electron beam ( ), a polyline on a substrate ( ) coated with a radiation-sensitive resist, the electron beam ( ) is directed onto a surface of the substrate ( ) in the direction of a Z coordinate, and the substrate ( ) is displaced relative to the electron beam ( ) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam ( ) acts with a predefined energy input on the substrate ( ) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.