Magdala, Germany

Rainer Plontke



Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2003-2011

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3 patents (USPTO):Explore Patents

Title: Rainer Plontke: Innovator in Electron Beam Lithography

Introduction

Rainer Plontke is a notable inventor based in Magdala, Germany. He has made significant contributions to the field of electron beam lithography, holding three patents that showcase his innovative approaches to producing resist profiled elements.

Latest Patents

One of his latest patents is titled "Device and method for producing resist profiled elements." This invention utilizes an electron beam lithography system to create an electron beam that is essentially perpendicular to a resist layer. The unique aspect of this invention is the ability to adjust the electron surface dose, allowing for the production of non-orthogonal resist profiled elements through electron beam irradiation. Another significant patent is "Method and apparatus for forming a curved polyline on a radiation-sensitive resist." This method involves directing an electron beam onto a substrate coated with a radiation-sensitive resist, with the substrate being displaced in an X-Y plane. The energy input for each step is determined based on the shape of the polyline, enabling the formation of polylines with uniform line widths, particularly suitable for writing curved polylines.

Career Highlights

Rainer Plontke has worked with prominent companies in the industry, including Leica Microsystems Lithography GmbH and Giesecke & Devrient GmbH. His experience in these organizations has contributed to his expertise in electron beam lithography and the development of innovative technologies.

Collaborations

Throughout his career, Rainer has collaborated with talented individuals such as Ines Stolberg and Michael Blume. These collaborations have likely enriched his work and contributed to the advancements in his field.

Conclusion

Rainer Plontke's contributions to electron beam lithography through his patents and career experiences highlight his role as an innovator in the field. His work continues to influence the development of advanced lithography techniques.

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