The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Mar. 30, 2005
Wittich Kaule, Emmering, DE;
Rainer Plontke, Magdala, DE;
Ines Stolberg, Jena, DE;
Andreas Schubert, Niederrossla, DE;
Marius Dichtl, Munich, DE;
Wittich Kaule, Emmering, DE;
Rainer Plontke, Magdala, DE;
Ines Stolberg, Jena, DE;
Andreas Schubert, Niederrossla, DE;
Marius Dichtl, Munich, DE;
Giesecke & Devrient GmbH, Munich, DE;
Vistec Electron Beam GmbH, Jena, DE;
Abstract
The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.