Jena, Germany

Ines Stolberg


Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2003-2011

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3 patents (USPTO):Explore Patents

Title: Ines Stolberg: Innovator in Electron Beam Lithography

Introduction

Ines Stolberg is a prominent inventor based in Jena, Germany. She has made significant contributions to the field of electron beam lithography, with a focus on producing resist profiled elements. Her innovative work has led to the development of several patents that enhance the precision and efficiency of lithographic processes.

Latest Patents

Ines Stolberg holds three patents, showcasing her expertise in advanced lithography techniques. Her latest patents include:

1. **Device and method for producing resist profiled elements** - This invention relates to a device and method that utilizes an electron beam lithography system to produce resist profiled elements. The electron beam is directed perpendicularly to a resist layer, allowing for the production of non-orthogonal resist profiled elements through precise adjustments of the electron surface dose.

2. **Method and apparatus for forming a curved polyline on a radiation-sensitive resist** - This method involves directing an electron beam onto a substrate coated with a radiation-sensitive resist. The substrate is displaced in an X-Y plane in individual steps, with the electron beam applying a predefined energy input during each halt in motion. This technique is particularly effective for writing curved polylines with uniform line widths.

Career Highlights

Ines Stolberg has worked with notable companies in the field, including Leica Microsystems Lithography GmbH and Giesecke & Devrient GmbH. Her experience in these organizations has contributed to her development as a leading inventor in electron beam lithography.

Collaborations

Throughout her career, Ines has collaborated with esteemed colleagues such as Rainer Plontke and Michael Blume. These partnerships have fostered innovation and advancement in her research and development efforts.

Conclusion

Ines Stolberg's contributions to electron beam lithography through her patents and collaborations highlight her role as a key innovator in the field. Her work continues to influence advancements in lithographic technology, paving the way for future innovations.

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