Company Filing History:
Years Active: 2003
Title: Innovations of Peter Hahmann
Introduction
Peter Hahmann is a notable inventor based in Jena-Drackendorf, Germany. He has made significant contributions to the field of lithography, particularly in methods for exposing substrates. With a total of two patents to his name, Hahmann's work is recognized for its technical complexity and innovative approach.
Latest Patents
Hahmann's latest patents include a "Method for exposing a layout comprising multiple layers on a wafer" and a "Method and device for exposing a substrate to light." The first patent focuses on a method for exposing a substrate equipped with an n-layer photoresist system. This invention creates an electrically conductive connection between a ground potential and the substrate, allowing for efficient charge dissipation. The second patent details an arrangement for carrying out this method, emphasizing the advancement of contact tips through various layers of the photoresist system to achieve optimal exposure.
Career Highlights
Peter Hahmann is currently employed at Leica Microsystems Lithography GmbH, where he continues to develop innovative solutions in lithography. His expertise in the field has positioned him as a key player in advancing technologies related to substrate exposure.
Collaborations
Hahmann collaborates with talented coworkers, including Dirk Beyer and Dorothee Krauhs, who contribute to the innovative environment at Leica Microsystems Lithography GmbH.
Conclusion
Peter Hahmann's contributions to lithography through his patents and collaborative efforts highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in substrate exposure technologies.