The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2003
Filed:
Sep. 21, 2000
Peter Hahmann, Jena-Drackendorf, DE;
Dirk Beyer, Weimar, DE;
Dorothee Krauhs, Jena, DE;
Thomas Elster, Jena, DE;
Leica Microsystems Lithography GmbH, Jena, DE;
Abstract
The invention concerns a method for exposing a substrate ( ) equipped with an n-layer photoresist system ( ), an electrically conductive connection being created between a ground potential and the substrate ( ) and/or at least one of the layers S through S of the photoresist system ( ). The invention furthermore concerns an arrangement for carrying out said method. According to the present invention, what is achieved in a single process step is that by way of spring elements E through E , a contact tip K is advanced as far as the layer S , a contact tip K is advanced through the layer S as far as the layer S , a contact tip K is advanced through the layer S and S as far as the layer S , and so forth. The electrical charges from the layer S are dissipated to the ground potential via the contact tip K , the charges from the layer S via the contact tip K , etc., and/or and from the substrate ( ) via a contact tip K .