The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jul. 30, 2004
Nigel Crosland, Linton, GB;
Klaus-dieter Adam, Jena, DE;
Timothy Groves, Cambridge, GB;
Jeffrey Kristoff, Hilton Head Island, SC (US);
Brian Rafferty, Bury St. Edmunds, GB;
Gerhard Schubert, Jena, DE;
Nigel Crosland, Linton, GB;
Klaus-Dieter Adam, Jena, DE;
Timothy Groves, Cambridge, GB;
Jeffrey Kristoff, Hilton Head Island, SC (US);
Brian Rafferty, Bury St. Edmunds, GB;
Gerhard Schubert, Jena, DE;
Leica Microsystems Lithography Ltd., Cambridge, GB;
Abstract
A dual-mode electron beam lithography machine () comprises an electron beam column () for generating an electron beam () for writing a pattern on a surface of a substrate) by way of a writing current, the substrate being supported on a stage () movable to displace the substrate relative to the beam. The column () includes beam deflecting plates () for deflecting the beam to scan the substrate surface in accordance with the pattern to be written and beam blanking plates () for blanking the beam to interrupt writing. The machine further comprises control means (to) for changing each of writing current, stage movement, beam deflection and beam blanking between a predetermined first mode optimised for pattern-writing accuracy, thus resolution, and a predetermined second mode different from the first mode and optimised for pattern-writing speed, thus throughput.