Company Filing History:
Years Active: 2006
Title: The Innovative Mind of Timothy Groves
Introduction
Timothy Groves is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of lithography, particularly with his innovative designs and technologies. His work has garnered attention for its potential to enhance the efficiency and accuracy of pattern writing in various applications.
Latest Patents
Timothy Groves holds a patent for a dual-mode electron beam lithography machine. This advanced machine comprises an electron beam column that generates an electron beam for writing patterns on a substrate's surface. The substrate is supported on a movable stage, allowing for precise displacement relative to the beam. The column includes beam deflecting plates for scanning the substrate surface according to the desired pattern and beam blanking plates for interrupting the writing process. The machine features control means for adjusting the writing current, stage movement, beam deflection, and beam blanking between two modes: one optimized for pattern-writing accuracy and resolution, and the other for pattern-writing speed and throughput. This innovation represents a significant advancement in lithography technology.
Career Highlights
Timothy Groves is currently employed at Leica Microsystems Lithography GmbH, where he continues to develop cutting-edge technologies in the field of lithography. His expertise and innovative approach have positioned him as a key figure in the industry.
Collaborations
Throughout his career, Timothy has collaborated with esteemed colleagues such as Nigel Crosland and Klaus-Dieter Adam. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Timothy Groves exemplifies the spirit of innovation in the field of lithography. His contributions, particularly the dual-mode electron beam lithography machine, highlight his commitment to advancing technology and improving efficiency in pattern writing. His work continues to inspire future developments in the industry.