Brian Rafferty

Title: Brian Rafferty: Innovator in Electron Beam Technology

Introduction

Brian Rafferty is a notable inventor based in Bury St Edmunds, GB. He has made significant contributions to the field of electron beam lithography, holding 2 patents that showcase his innovative approach to enhancing writing resolution and throughput in lithography machines.

Latest Patents

Rafferty's latest patents include the "Dual-mode electron beam column" and the "Dual-mode electron beam lithography machine." The dual-mode electron beam column is designed to provide a Gaussian beam for enhanced writing resolution and a variable shaped beam for improved writing throughput. This invention features a first aperture for beam confinement, a first lens for focusing the beam, and a beam-shaping second aperture that can be positioned in the beam path. The second lens focuses the beam in a second image plane, while a third aperture confines or shapes the beam depending on the mode. The variation of the shaped beam is achieved through a beam double deflector system that operates only in the shaped beam mode.

The dual-mode electron beam lithography machine comprises an electron beam column that generates an electron beam for writing patterns on a substrate's surface. The substrate is supported on a movable stage, allowing for relative displacement between the substrate and the beam. The column includes beam deflecting plates for scanning the substrate surface and beam blanking plates for interrupting the writing process. This machine features control means for adjusting writing current, stage movement, beam deflection, and beam blanking between two predetermined modes: one optimized for pattern-writing accuracy and the other for pattern-writing speed.

Career Highlights

Throughout his career, Brian Rafferty has worked with prominent companies in the lithography sector, including Vistec Lithography Limited and Leica Microsystems Lithography GmbH. His experience in these organizations has contributed to his expertise in electron beam technology and innovation.

Collaborations

Rafferty has collaborated with notable professionals in the field, including Nigel Crosland and Klaus-Dieter Adam. These collaborations have likely enriched his work and contributed to the advancements in electron beam lithography.

Conclusion

Brian Rafferty's contributions to electron beam technology through his patents and career highlights demonstrate his commitment to innovation in the field. His work continues to influence advancements in lithography, showcasing the importance of inventors in driving technological progress.