The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Nov. 17, 2005
Brian Rafferty, Bury St. Edmunds, GB;
Brian Rafferty, Bury St. Edmunds, GB;
Vistec Lithography Limited, Cambridgeshire, GB;
Abstract
A dual-mode electron beam column () for selectably providing, in an electron beam lithography machine, a Gaussian beam for enhanced writing resolution and a variable shaped beam for enhanced writing throughput comprises a first aperture () for confining the beam, a first lens () for focussing the beam at a first image plane positioned in dependence on the beam mode, a beamshaping second aperture () positionable in the beam path in the shaped beam mode, a second lens () effective in the shaped beam mode to focus the beam in a second image plane, and a third aperture () in the second image plane to confine or shape the beam depending on mode. Variation of the shape of the shaped beam is achieved by a beam double deflector system () operable only in the shaped beam mode.