The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Sep. 11, 2000
Applicant:
Inventors:
David Martin Platton King, Herts, GB;
Barrie James Hughes, Cambridgeshire, GB;
Assignee:
Leica Microsystems Lithography Limited, Cambridge, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/730 ;
U.S. Cl.
CPC ...
H01J 3/730 ;
Abstract
A method of writing a pattern on the surface of a substrate by an electron beam is provided comprising exposing the substrate surface to an electron beam controlled to progressively describe the pattern by stepped movement of a focussed spot of the beam over the surface, and varying the exposure of the surface to the beam by selectably modulating the beam in the periods between successive movement steps to reduce the level of electron dose in predetermined positions of the beam spot on the surface.