This inventor holds 1 USPTO granted patent. Top assignee: Leica Microsystems Lithography Gmbh. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Barrie James Hughes: Innovator in Electron Beam Technology
Introduction
Barrie James Hughes is a notable inventor based in Cambridgeshire, GB. He has made significant contributions to the field of electron beam technology, particularly in the area of pattern writing.
Latest Patents
Hughes holds a patent for a "Method of and machine for pattern writing by an electron beam." This innovative method involves writing a pattern on the surface of a substrate by exposing it to an electron beam. The process is controlled to progressively describe the pattern through the stepped movement of a focused spot of the beam over the surface. Additionally, the exposure of the surface to the beam is modulated during the periods between successive movement steps, which helps to reduce the level of electron dose in predetermined positions of the beam spot on the surface.
Career Highlights
Barrie James Hughes is associated with Leica Microsystems Lithography GmbH, where he applies his expertise in electron beam technology. His work has been instrumental in advancing the capabilities of lithography processes.
Collaborations
Hughes collaborates with David Martin Platton King, contributing to the development of innovative technologies in their field.
Conclusion
Barrie James Hughes is a distinguished inventor whose work in electron beam technology has paved the way for advancements in pattern writing methods. His contributions continue to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile