The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Feb. 03, 2006
Stefan Risse, Jena, DE;
Thomas Peschel, Jena, DE;
Christoph Damm, Jena, DE;
Andreas Gebhardt, Apolda, DE;
Mathias Rohde, Jena, DE;
Christoph Schenk, Jena, DE;
Thomas Elster, Jena, DE;
Hans-joachim Doering, Jena, DE;
Gerhard Schubert, Jena, DE;
Stefan Risse, Jena, DE;
Thomas Peschel, Jena, DE;
Christoph Damm, Jena, DE;
Andreas Gebhardt, Apolda, DE;
Mathias Rohde, Jena, DE;
Christoph Schenk, Jena, DE;
Thomas Elster, Jena, DE;
Hans-Joachim Doering, Jena, DE;
Gerhard Schubert, Jena, DE;
Leica Microsystems Lithography GmbH, Jena, DE;
Abstract
The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.