Jena, Germany

Mathias Rohde

This inventor holds 1 USPTO granted patent. Top assignee: Leica Microsystems Lithography Gmbh. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mathias Rohde. Retrieved from https://idiyas.com/inventor/mathias-rohde-i0nb6dcy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Mathias Rohde in Electrostatic Deflection Systems

Introduction

Mathias Rohde is a notable inventor based in Jena, Germany. He has made significant contributions to the field of electrostatic deflection systems, particularly in applications related to microstructured and nanostructured technologies. His work is essential for advancements in lithography installations and measuring equipment.

Latest Patents

Mathias Rohde holds a patent for an "Electrostatic deflection system for corpuscular radiation." This invention focuses on electrostatic deflection systems designed for corpuscular beams. The system aims to maintain a precise axially symmetric arrangement of individual electrodes, which is crucial for the effective operation of the deflection system. The rod-shaped electrodes are securely held in an inwardly hollow carrier, allowing a corpuscular beam to pass through efficiently.

Career Highlights

Rohde's career is marked by his innovative approach to developing technologies that enhance the precision of lithography and measurement processes. His patent reflects a deep understanding of the complexities involved in manipulating corpuscular beams, showcasing his expertise in the field.

Collaborations

Mathias Rohde has collaborated with esteemed colleagues such as Stefan Risse and Andreas Gebhardt. Their combined efforts contribute to the advancement of technologies in their respective fields.

Conclusion

Mathias Rohde's contributions to electrostatic deflection systems highlight his role as an influential inventor in the realm of advanced technology. His patent serves as a testament to his innovative spirit and dedication to improving microstructured applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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