Leica Microsystems Lithography Gmbh

Mathias Rohde

Christoph Damm

Thomas Peschel

Stefan Risse

Thomas Elster

Gerhard Schubert

Hans-Joachim Doering

Christoph Schenk

Andreas Gebhardt

The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

Electrostatic deflection system for corpuscular radiation

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Jena, Germany

Mathias Rohde