Vistec Electron Beam Gmbh

Leica Microsystems Lithography Gmbh

Hans-Joachim Doering

Thomas Elster

Joachim Heinitz

Christoph Damm

Thomas Peschel

Stefan Risse

Matthias Slodowski

Gerhard Schubert

Christoph Schenk

Andreas Gebhardt

Mathias Rohde

The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns

The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m&#xd7;n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate

An illumination condenser for a particle optics projection system is disclosed. The illumination condenser is formed of a magnetic lens comprising a plurality of gaps. The magnetic lens is formed of a sequence of a plurality of partial lenses.

Illumination condenser for a particle optical projection system

A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between the first magnetic lens and second magnetic lens and the particle beam.

Correction lens system for a particle beam projection device

The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

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Jena, Germany

Hans-Joachim Doering