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Yokohama, Japan

Nuflare Technology, Inc.

USPTO Granted Patents = 744

% Expired Patents = 11.8

EPO Patents = 3

Trademarks = 5

Forward Citations = 2,204

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310 inventors (with patents filed for the assignee):

Hiroshi Matsumoto (58 out of 145 patents)

Munehiro Ogasawara (49 out of 72 patents)

Riki Ogawa (47 out of 64 patents)

4. Kunihiko Suzuki (41 out of 148 patents)

5. Takayuki Abe (34 out of 107 patents)

6. Yasuo Kato (32 out of 41 patents)

7. Hideo Tsuchiya (30 out of 54 patents)

8. Jun Yashima (30 out of 30 patents)

9. Nobutaka Kikuiri (26 out of 43 patents)

10. Noriaki Nakayamada (25 out of 27 patents)

11. Takanao Touya (24 out of 24 patents)

12. Kenichi Yasui (23 out of 23 patents)

13. Hideo Inoue (23 out of 24 patents)

14. Rieko Nishimura (22 out of 22 patents)

15. Hirofumi Morita (21 out of 35 patents)

Core Competencies:

Charged Particle Beam

Defect Inspection

Pattern Inspection

Electron Beam

Multi-Charged Particle

Inspection Apparatus

Susceptor

Film Deposition

Vapor Phase Growth

Image Acquisition

Adjustment Method

Thermal Field Emission

744 patents: Sort by Forward Citations

1. 12731759 - Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector (2026-09-08),

2. D1144479 - Cover for gas ring (2026-08-25),

3. 12695046 - Method for estimating cathode lifetime of electron gun, and electron beam writing apparatus (2026-07-28),

4. D1130341 - Susceptor (2026-06-16),

5. 12658405 - Charged particle beam writing method and charged particle beam writing apparatus (2026-06-16),

6. 12640341 - Charged particle beam writing method and charged particle beam writing apparatus (2026-05-26),

7. 12640331 - Mounting substrate, blanking aperture array chip, blanking aperture array system and multi charged particle beam irradiation apparatus (2026-05-26),

8. 12626886 - Multi charged particle beam writing apparatus (2026-05-12),

9. 12626428 - Drawing data examination method for examining drawing data of a figure expressed by a B-spline curve, drawing method, drawing apparatus, and non-transitory storage medium (2026-05-12),

10. D1125094 - Susceptor (2026-05-05),

11. 12620545 - Blanking aperture array system and multi charged particle beam writing apparatus (2026-05-05),

12. 12613195 - Adjustment method of inspection apparatus focus position, and pattern inspection apparatus (2026-04-28),

13. 12609278 - Multi charged particle beam writing method and multi charged particle beam writing apparatus (2026-04-21),

14. 12592360 - Multi charged particle beam writing method and multi charged particle beam writing apparatus (2026-03-31),

15. 12580148 - Multi charged particle beam writing apparatus (2026-03-17),

Nuflare Technology, Inc., based in Yokohama, Japan, specializes in advanced charged particle beam writing technologies. The company focuses on developing innovative solutions for defect and pattern inspection, utilizing electron beam and multi-charged particle technologies. Nuflare's expertise extends to the design and manufacture of inspection apparatuses and film deposition systems, catering to the semiconductor industry and enhancing the precision of microfabrication processes. Their commitment to research and development positions them as a key player in the field of nanotechnology.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

744 Patents

#7 in Yokohama

#278 in Japan

#1,337 in the World

Yokohama, Japan

Nuflare Technology, Inc.

Forward Citations = 2,204

310 inventors:

Hiroshi Matsumoto (58 out of 145 patents)

Munehiro Ogasawara (49 out of 72 patents)

Riki Ogawa (47 out of 64 patents)

4. Kunihiko Suzuki (41 out of 148 patents)

5. Takayuki Abe (34 out of 107 patents)

Please report any incorrect information to [email protected]

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