Hiratsuka, Japan

Munehiro Ogasawara

This inventor holds 72 USPTO granted patents and 15 published patent applications and 1 EPO patent, primarily in Charged Particle Beams (CPC class H01J). Top assignees: Nuflare Technology, Inc., Kabushiki Kaisha Toshiba, Nuflare Technology America, Inc.. Active years: 1988-2025.

USPTO Granted Patents = 72 

% Patents Active = 91.7

 

Average Co-Inventor Count = 1.9

ph-index = 7

Forward Citations = 220(Granted Patents)

Forward Citations (Not Self Cited) = 174(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kawasaki, JP (1988)
  • Fujisawa, JP (1996 - 2006)
  • Kanagawa-ken, JP (1998 - 2008)
  • Kanagawa, JP (2013 - 2018)
  • Yokohama, JP (2021)
  • Hiratsuka, JP (2006 - 2024)

Company Filing History:


Years Active: 1988-2025

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Areas of Expertise:
Multi-Electron Beam
Charged Particle Beam
Image Acquisition
Inspection Apparatus
Lithography
Writing Method
Aberration Corrector
Beam Irradiation
Optical System
Deflector
Energy Beam
72 patents (USPTO):Explore Patents

Title: **Munehiro Ogasawara: Innovator and Patent Holder in Charged Particle Beam Technology**

Introduction

Munehiro Ogasawara, based in Hiratsuka, Japan, is an accomplished inventor with a remarkable portfolio of 71 patents. His work primarily focuses on advancements in charged particle beam technology, which holds significant implications for various applications in electronics and materials science.

Latest Patents

Among his latest innovations are two noteworthy patents. The first is a **Drawing Apparatus and Deflector**, which features a unique blanking deflector design. This system incorporates a first and second electrode, each consisting of insulators and low-resistance films to optimize the control of a charged particle beam for specimen irradiation. The second patent, titled **Charged Particle Beam Writing Method, Charged Particle Beam Writing Apparatus, and Computer-Readable Recording Medium**, outlines a method where a deflector manipulates the beam to write patterns on substrates. This method involves sophisticated calculations to adjust the beam's position based on charge distributions, ensuring precision in the writing process.

Career Highlights

Munehiro has contributed to renowned companies in the technology sector, including Nuflare Technology, Inc. and Kabushiki Kaisha Toshiba. His roles at these firms have allowed him to explore and develop innovative solutions in semiconductor manufacturing and related fields.

Collaborations

Throughout his career, Munehiro Ogasawara has collaborated with esteemed colleagues such as Ryoichi Yoshikawa and Takanao Touya. Their combined expertise in the field has undoubtedly fostered an environment conducive to groundbreaking developments in their respective projects.

Conclusion

Munehiro Ogasawara stands out as a prolific inventor whose patents contribute significantly to the advancement of charged particle beam technology. His continued innovation and collaborative efforts reflect the dynamic nature of technology development in Japan and beyond. With 71 patents to his name, Ogasawara's influence in the field is poised to shape future technologies and applications.

Profile summary based on public USPTO records.
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