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For the Inventor, By the Inventor

Kanagawa, Japan

Takanao Touya

This inventor holds 24 USPTO granted patents and 4 published patent applications, primarily in Charged Particle Beam Technology. Top assignees: Nuflare Technology, Inc., Kabushiki Kaisha Toshiba. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takanao Touya. Retrieved from https://idiyas.com/inventor/takanao-touya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 66(Granted Patents)


Location History:

  • Kanagawa, JP (2011 - 2021)
  • Yokohama, JP (2023)
  • Kawasaki, JP (2018 - 2024)

Company Filing History:

goldMedal24 out of 748 
 
Nuflare Technology, Inc.
 patents
silverMedal1 out of 53,276 
 
Kabushiki Kaisha Toshiba
 patents
where one patent can have more than one assignee

Years Active: 2011-2026

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Areas of Expertise:
Charged Particle Beam
Irradiation Apparatus
Writing Method
Electron Beam
Adjustment Method
Blanking Device
Multi Charged Beam
Inspection System
Pattern Writing
Beam Incident Angle
Pattern Errors
Correlation Table
24 patents (USPTO):Explore Patents
1. 12640331 - Mounting substrate, blanking aperture array chip, blanking aperture array system and multi charged particle beam irradiation apparatus (2026-05-26),
2. 12592360 - Multi charged particle beam writing method and multi charged particle beam writing apparatus (2026-03-31),
3. 12009175 - Charged particle beam writing apparatus (2024-06-11),
4. 11908659 - Multi charged particle beam writing apparatus (2024-02-20),
5. 11804360 - Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus (2023-10-31),
6. 11145483 - Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method (2021-10-12),
7. 10998164 - Charged particle beam writing apparatus and charged particle beam writing method (2021-05-04),
8. 10504686 - Charged particle beam writing method and charged particle beam writing apparatus (2019-12-10),
9. 10224171 - Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus (2019-03-05),
10. 10192712 - Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method (2019-01-29),
11. 9916962 - Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method (2018-03-13),
12. 9824849 - Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method (2017-11-21),
13. 9406117 - Inspection system and method for inspecting line width and/or positional errors of a pattern (2016-08-02),
14. 9373424 - Electron beam writing apparatus and electron beam writing method (2016-06-21),
15. 9343266 - Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table (2016-05-17),

Title: Inventor Spotlight: Takanao Touya - Pioneering Innovator in Multi Charged Particle Beam Technology

Introduction: Takanao Touya, a distinguished inventor hailing from Kanagawa, Japan, has made significant contributions to the field of multi charged particle beam technology. With an impressive portfolio of 21 patents, he continues to push the boundaries of innovation in this specialized area.

Latest Patents: Among his recent inventions is the Multi Charged Particle Beam Writing Apparatus, a groundbreaking technology designed to enhance the precision and efficiency of charged particle beam writing. Additionally, Touya developed methods and apparatus for adjusting and irradiating multi charged particle beams, showcasing his expertise in optimizing beam performance.

Career Highlights: Throughout his career, Takanao Touya has been associated with prominent companies such as Nuflare Technology, Inc. and Kabushiki Kaisha Toshiba. His invaluable contributions have significantly impacted the advancement of multi charged particle beam technology, positioning him as a leading figure in the industry.

Collaborations: Touya has had the privilege of collaborating with esteemed professionals in the field, including Munehiro Ogasawara and Takahito Nakayama. Together, they have collectively worked towards pioneering new innovations and driving technological advancements in multi charged particle beam applications.

Conclusion: Takanao Touya's dedication to innovation and his pioneering work in multi charged particle beam technology underscores his status as a visionary inventor. His patents and collaborations serve as a testament to his remarkable contributions to the field, cementing his legacy as a trailblazer in the realm of advanced beam technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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