The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Mar. 22, 2022
Applicant:
Nuflare Technology, Inc., Yokohama, JP;
Inventors:
Hirofumi Morita, Setagaya-ku, JP;
Takanao Touya, Kawasaki, JP;
Assignee:
NuFlare Technology, Inc., Yokohama, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/12 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 37/12 (2013.01); H01J 37/3174 (2013.01);
Abstract
In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.