The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jun. 08, 2022
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventors:

Toshiki Kimura, Yokohama, JP;

Hirofumi Morita, Setagaya-ku, JP;

Takanao Touya, Kawasaki, JP;

Mitsuhiro Okazawa, Yokohama, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/09 (2006.01); H01J 37/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/045 (2013.01); H01J 37/09 (2013.01); H01J 2237/0435 (2013.01);
Abstract

In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.


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